can't read?
RIDADR NONH for all modes of transport
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
For any quries, please write to us at
1309-48-4
Magnesium oxide, (single crystal substrate), 10 x 10 x 1.0 mm, Orientation : < 100>+/-0.3degree
Silicon wafer, <100>, p-type, contains Boron (B) as dopant, diam. x thickness 150 mm x 320 μm
Ruthenium sputtering target dia x thickness 2 inch × 1 mm, ≥99.9%
16456-81-8
5,10,15,20-Tetraphenyl-21H,23H-porphine iron(III) chloride, 94%
Our team of R&D Experts and Scientists have expertise in all areas of research of Lab Chemicals, Nano Technology, Life Science, Custom Synthesis, Chromatography, and many others.
DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.