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Silicon wafers or a “slice” of substrate find applications in the fabrication of integrated circuits, solar cells etc. They serve as a substrate for various microelectronic devices.
SSC 076 - Silicon wafer (single side polished), <100>, P-type, contains boron as dopant, diam. × thickness 2 in. x 0.5 mm - used in electronics for the fabrication of integrated circuits and in photovoltaics for conventional, wafer-based solar cells.
WGK Germany 2
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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Barium fluoride window diam. x thick 57 mm x 8 mm
7789-24-4
Lithium fluoride window diam. x thick 10 mm x 1.5 mm
7440-21-3
Silicon wafer (single side polished), <100>, N (Phosphorous doped), diam. x thickness 50.8 mm x 280 μm
β Barium borate crystals (10 x 10 x 0.1 mm3)
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.