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B 0521 (OTTO) Boron silicide, 200 mesh, 98% Cas no 12008-29-6 - used in chemical research, pharmaceuticals and as an intermediate.
Hazard Codes Xi
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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7440-21-3
Silicon wafer (single substrase), <100>, N-type, contains phosphorus (Ph) as dopant, diam. x thickness 100 mm x 0.525 mm
7440-06-4
Platnium sputtering target, dia 3 inch x 0.5 mm thick, 99.95%
7446-07-3
Tellurium oxide, 99.5%
LSAT single crystal substrate, 10 x 10 x 0.5 mm, Orientation <100>, 99.99%
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.