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Silicon wafers or a “slice” of substrate find applications in the fabrication of integrated circuits, solar cells etc. They serve as a substrate for various microelectronic devices.
SSC 076 - Silicon wafer (single side polished), <100>, P-type, contains boron as dopant, diam. × thickness 2 in. x 0.5 mm - used in electronics for the fabrication of integrated circuits and in photovoltaics for conventional, wafer-based solar cells.
WGK Germany 2
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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7789-24-4
Lithium fluoride, optical windows, 50 mm dia, 4 mm thick
7440-21-3
Silicon wafer, <111>, P-type, contains boron as dopant, diam. × thickness 2 in x 250 μm
Barium fluoride window diam. x thick 44.45 mm x 3.5 mm
1303-00-0
Gallium arsenide (GaAs substrate), <001>, diam. × thickness 2” (50.8 mm) × 0.35 mm
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.