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WGK Germany nwg
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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Fe38 Co38Si14B10 alloy sputtering target dia x thickness 2 inch × 1.5 mm, ≥99.9%
12068-69-8
Bismuth selenide doped with chromium, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Cr)
Tantalum sputtering target dia x thickness 2 inch × 1 mm, ≥99.95%
7440-21-3
Silicon wafer (single substrase), <100>, n-type, contains Phosphorus as dopant, diam. × thickness 2 inch x 0.3 mm
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.