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M 7030 (OTTO) Molybdenum sputtering target, diam. x thickness 3 inch x 2.5 mm, 99.95% Cas 7439-98-7 - used in electronic and semiconductor application.
WGK Germany 3
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
For any quries, please write to us at
7440-32-6
Titanium sputtering target, diam. × thickness 50 mm × 5 mm, 99.99%
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Vanadium sputtering target, diam. × thickness 2 inch × 0.125 inch, 99.95%
1309-48-4
Magnesium oxide, (single crystal substrate), <100>
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.