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Copper sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%

Code: C 1051

puriss

Cu

74061000

99.99%

63.55

Box
18%

puriss

Cu

74061000

99.99%

63.55

Box

18%
PackingsPrice (INR)
1 pc 4959.00
5 x 1 pc POR
Custom Size POR
Packings
Enquire
Properties
99.99%

Solid

50.6 mm

± 0.2 mm

3 mm

± 0.2 mm

2567 °C(lit.)

8.94 g/mL at 25 °C(lit.)

Description

Copper is a chemical element with symbol Cu. It is a soft, malleable and ductile metal with very high thermal and electrical conductivity.

Application

C 1051 (OTTO) Copper sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99% - used mostly as a pure metal, but when greater hardness is required

Safety Information

RIDADR UN 3077 9 / PGIII


WGK Germany nwg

Documentation

Certificate Of Analysis

(For eg. B 1615-0108)

Other Documents

For any quries, please write to us at

qc@ottokemi.com
Technical Services

Our team of R&D Experts and Scientists have expertise in all areas of research of Lab Chemicals, Nano Technology, Life Science, Custom Synthesis, Chromatography, and many others.

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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received.
Not for medical, household or any other uses, for lab use only, Please test before use.


PackingsPrice (INR)
1 pc 4959.00
5 x 1 pc POR
Custom Size POR