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: ASC 054
: 1344-28-1
: Al2O3
: 101.96
: Common substrate for III-V nitrides as well as many other epitaxial films.
: Materials science,Single crystal substrates
: 10 x 10 x 1.0 mm
: 11-20>+/-0.3degree
: Two sides polished
: < =0.5 nm
WGK Germany nwg