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Magnesium oxide is an excellent single-crystal substrate for thin films of ferromagnetic, photo-electronic, and high Tc superconductor materials.
WGK Germany 1
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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7440-18-8
Ruthenium sputtering target 3 inch dia x 2 mm thick, ≥99.95%
1309-48-4
Magnesium oxide (single crystal substrate), <100>, ≥99.9% trace metals basis, L × W × thickness 10 mm × 10 mm × 0.2 mm
7440-21-3
Silicon wafer (single substrase), <100>, p-type, contains Boron (B) as dopant, diam. × thickness 2 in. × 0.1 mm
Stellitee 6 powder, 53-150um
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