can't read?
T 7209 (OTTO) Titanium sputtering target, diam. × thickness 3 in. × 2.5 mm, 99.95% - used in pharmaceutical and bio chemical industry.
WGK Germany nwg
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
For any quries, please write to us at
7440-74-6
Indium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
12060-59-2
Strontium titanium oxide wafer, <100>, diam. × thickness 1 in x 0.5 mm
Nickel sputtering target 99.95% 3 inch dia x 2.5 mm thick
409-21-2
Silicon carbide (4H-SiC) wafers, dia 100 mm, thick 1.5 mm
Our team of R&D Experts and Scientists have expertise in all areas of research of Lab Chemicals, Nano Technology, Life Science, Custom Synthesis, Chromatography, and many others.
DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.