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Tantalum sputtering target, 99.95% (L x W x Thick 700 x 25.4 x 3 mm)

Code: T 4884
7440-25-7
for synthesis
Ta
810390.00
99.95%
180.95
Container
18%
7440-25-7
for synthesis
Ta
810390.00
99.95%
180.95
Container
18%
PackingsPrice (INR)
1 pc POR
Custom size POR
Packings
Tantalum sputtering target, 99.95% (L x W x Thick 700 x 25.4 x 3 mm), T 4884, (1)
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Properties
Materials science,Sputtering targets
99.95%
700 x 25.4 x 3 mm
± 5%
5425 °C
2996 °C
16.69 g/cm3
Description

Tantalum is a chemical element with symbol Ta and atomic number 73.

Application

T T 4884 (OTTO) Tantalum sputtering target, 99.95% (L x W x Thick 700 x 25.4 x 3 mm) - used to produce a variety of alloys that have high melting points, strength, and ductility.

Safety Information

Personal Protective Equipment Eyeshields, Gloves, type N95 (US), type P1 (EN143) respirator filter

WGK Germany nwg

Documentation

Certificate Of Analysis

(For eg. B 1615-0108)

Other Documents

For any quries, please write to us at

qc@ottokemi.com
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Technical Services

Our team of R&D Experts and Scientists have expertise in all areas of research of Lab Chemicals, Nano Technology, Life Science, Custom Synthesis, Chromatography, and many others.

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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received.
Not for medical, household or any other uses, for lab use only, Please test before use.

PackingsPrice (INR)
1 pc POR
Custom size POR