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Tantalum is a chemical element with symbol Ta and atomic number 73.
T 0356 (OTTO) Tantalum, sputtering target, 99.95% (L x W x Thick 14 x 1 x 2 mm) - used to produce a variety of alloys that have high melting points, strength, and ductility.
Personal Protective Equipment Eyeshields, Gloves, type N95 (US), type P1 (EN143) respirator filter
Certificate Of Analysis
(For eg. B 1615-0108)
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7440-21-3
Silicon wafer (single substrase), <100>, p-type, contains Boron (B) as dopant, diam. x thickness 100 mm x 0.525 mm
111-31-9
1-Hexanethiol, 97%
50926-11-9
Indium tin oxide coated, glass substrate, 10 x 10 x 0.7 mm3
12068-69-8
Bismuth selenide doped with copper, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Cu)
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