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M 8227 (OTTO) Molybdenum sputtering target, diam. x thickness 3 inch x 2.5 mm, 99.95% Cas 7439-98-7 - used in electronic and semiconductor application.
WGK Germany 3
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
For any quries, please write to us at
7440-58-6
Hafnium sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
7440-24-6
Strontium, granular, 99.99%
12537-81-4
Titanium aluminium carbide 211, ≥80%, ≤40 μm particle size
Yttrium-Stabilized Zirconia, single crystal substrates, 10mm x 10mm x 0.5mm, <100>
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.