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Ga2O3 has the potential to be used as a transparent and conductive substrate for GaN-growth.
Gallium oxide single crystals has been studied in the use of lasers, phosphors, and luminescent materials.
WGK Germany 1
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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Magnesium oxide sputtering target dia x thickness 2 inch × 2 mm, ≥99.9%
7440-50-8
Copper sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
Nickel sputtering target 99.95% 3 inch dia x 2.5 mm thick
1314-98-3
Zinc sulphide (backing plate copper) sputtering target, diam. x thickness 50 mm × 5 mm, 99.9%
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