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Ga2O3 has the potential to be used as a transparent and conductive substrate for GaN-growth.
Gallium oxide single crystals has been studied in the use of lasers, phosphors, and luminescent materials.
WGK Germany 1
Certificate Of Analysis
(For eg. B 1615-0108)
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7440-21-3
Silicon sputtering target, diam. × thickness 2 inch × 3 mm, 99.999%
Co76Si14B10 alloy sputtering target dia x thickness 2 inch × 1.5 mm, ≥99.9%
Ni80Cr20 sputtering target 99.95% 3 inch dia x 2 mm thick
7440-02-0
Nickel sputtering target, diam. x thickness 50.6 mm x 3 mm, 99.99%
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