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Synonyms: AZO
Bonded by Indium to a flat copper back plate (2 mm)
A 8154 (OTTO) Aluminium zinc oxide sputtering target, diam. × thickness 50.8 mm × 3 mm - used in a metal oxide to modify or improve its properties.
WGK Germany 2
Certificate Of Analysis
(For eg. B 1615-0108)
Other Documents
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7440-21-3
Silicon wafer (single substrase), <100>, p-type, contains Boron (B) as dopant, diam. x thickness 100 mm x 0.525 mm
1309-48-4
Magnesium oxide, (single crystal substrate), 10 x 10 x 0.5 mm, Orientation <100>, 99.99%
IR-806, dye content 90%
7440-32-6
Titanium sputtering target, diam. × thickness 50 mm × 5 mm, 99.99%
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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received. Not for medical, household or any other uses, for lab use only, Please test before use.