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Silicon wafers, P-type, dia 4 inch, thick 0.525 mm [Thermal oxide wafer 100 nm SiO2 layer on Si (100)]

Code: SIW 606
9001
18%
9001
18%
PackingsPrice (INR)
1 pc 240399.00
10 x 1 pc POR
Packings
Silicon wafers, P-type, dia 4 inch, thick 0.525 mm [Thermal oxide wafer 100 nm SiO2 layer on Si (100)], SIW 606, (1)
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Properties
Crystal optics,Chemically coated windows / substrates
4 Inch
± 1 %
0.525 mm
± 1%
P type
100 nm SiO2 Layer on Si (100)
Single side polished
<5A
1-10 ohm cm
Safety Information

Safety Information for this product is unavailable at this time.

Documentation

Certificate Of Analysis

(For eg. B 1615-0108)

Other Documents

For any quries, please write to us at

qc@ottokemi.com
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Technical Services

Our team of R&D Experts and Scientists have expertise in all areas of research of Lab Chemicals, Nano Technology, Life Science, Custom Synthesis, Chromatography, and many others.

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DisclaimerThe above particulars do not release the customer from the obligation to carry out an inspection of goods received.
Not for medical, household or any other uses, for lab use only, Please test before use.

PackingsPrice (INR)
1 pc 240399.00
10 x 1 pc POR